Crystal film deposition device for template manufacturing
Supports everything from UVLED to advanced power devices, with simple processes for nitride film crystal growth using PVD.
A crystalline nitride film formation device using PVD (sputtering) that contributes to the mass production of ultraviolet LEDs. Crystalline thin films comparable to the CVD method are formed by PVD (sputtering). Simple, safe, and easy to handle. Promotes the latest nitride semiconductor processes through simpler device management and operation. Robust and advanced process performance that supports a wide range of applications from R&D to full-scale mass production. The latest crystalline film deposition device that updates the trends in nitride semiconductors.
- Company：神港精機 東京支店
- Price：Other
